Aug. 03, 2012
NewsCompany News

EUV Lithography: BMBF Project Leads to Enhancement

EUV lithography uses extreme ultraviolet (EUV) light to create the structures on microchips. A new project has started, which is sponsored by the German Ministry of Education and Research (BMBF). Carl Zeiss will lead the project about this innovative technology that will be ready for production at the end of the year and enable the manufacture of structures as small as 20 nanometers. The objective of the joint ETIK project ("EUV projection optics for 14 nm resolution") now is to improve the resolution that can be achieved with EUV lithography to at least 14 nanometers. The ongoing miniaturization of structures increases the performance of microchips and helps reduce the costs of electronic devices. The BMBF is sponsoring the three-year project with a total of 7 million euros.



Carl Zeiss SMT
Carl-Zeiss-Str. 22
73447 Oberkochen
Phone: +49 (0) 7364/203836
Telefax: +49 (0) 7364/204343

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